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| Price | Negotiable |
| MOQ | Negotiable |
| Delivery Time | 7-10 work days after received the payment |
| Brand | ZHENAN |
| Place of Origin | China |
| Certification | ISO9001:2015 |
| Model Number | Tungsten Sputtering Target |
| Packaging Details | 1MT big bag or as per customer request |
| Payment Terms | L/C, T/T, Western Union |
| Supply Ability | 2000MT/per Month |
| Place of Origin | China | Shape | Round |
| Packaging Details | 1MT big bag or as per customer request | Product Name | Tungsten Sputtering Target |
| Purity | 99.95% | Model Number | Tungsten Sputtering Target |
| Supply Ability | 2000MT/per Month | Certification | ISO9001:2015 |
| Brand Name | ZHENAN | Payment Terms | L/C, T/T, Western Union |
| Price | Negotiable | Delivery Time | 7-10 work days after received the payment |
| Minimum Order Quantity | Negotiable | Application | Evaporation, coating, sputtering |
Tungsten Sputtering Target
Description:
Tungsten sputtering target is a product made of pure tungsten powder as raw material. It has a silvery white appearance and is popular in many fields because of its excellent physical and chemical properties.
Specifications:
Application:
Tungsten sputtering targets have high purity, and the purity of the targets after sintering and forging can usually be higher than 99.95%. Generally speaking, when other conditions remain unchanged, the higher the purity of the target material, the better the electrical properties of the coating produced, and the corresponding circuit is less likely to be short-circuited or damaged.
The cost is relatively reasonable. Direct pressing using powder metallurgy is faster, which can effectively shorten the production cycle and thereby reduce costs.High density, the density of the target material after sintering and forging can reach more than 19.1g/cm³.
Tungsten Alloy Sputtering Target are widely used in flat panel displays, solar cells, integrated circuits, automotive glass, microelectronics, memory, X-ray tubes, medical equipment, smelting equipment and other products.
Tungsten Sputtering Target are generally prepared using powder metallurgy methods. First, place the tungsten powder in a vacuum heat treatment furnace for pre-degassing, then introduce hydrogen and continue heating for degassing; second, complete the sintering of the degassed tungsten powder through vacuum hot pressing;
Third, sinter Tungsten sputtering targets once The sintered product is secondary sintered through a hot isostatic press; fourth, the entire surface of the secondary sintered product is ground through mechanical processing to obtain the product. Note: 1) The purity of tungsten powder must be above 99.999% and the particle size should be between 3.2-4.2μm.
FAQ:
Q:
Are
you
a
factory
or
trading
company?
A:
Both.
We
have
4500
square
meters
production
workshop
and
professional
service
team
in
Henan
Province,
China.
Q:
Do
you
provide
samples?
A:
Yes,
we
provide
free
samples
for
you
to
reference,
you
only
need
to
pay
for
freight.
Q:
Can
we
visit
the
factory?
A:
We
looking
forward
to
you
visit
our
factory
at
any
time.
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